2010~before Agglomerated Large Particles under Various Slurry Preparation Conditions and Their Influence on Shallow Trench Isolation Chemical Mechanical Polishing
본문
- Journal
- Japanese Journal of Applied Physics
- Vol
- 44
- Page
- 7770
- Year
- 2010~before
- 이전글The Effect of Cerium Precursor Agglomeration on the Synthesis of Ceria Particles and Its Influence on Shallow Trench Isolation Chemical Mechanical Polishing Performance 24.06.14
- 다음글Effect of Dispersant Addition During Ceria Abrasive Milling Process on Light Point Defect (LPD) Formation after Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP) 24.06.14