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Journal

2010~before Dependence of Non-Prestonian Behavior of Ceria Slurry with Anionic Surfactant on Abrasive Concentration and Size in Shallow Trench Isolation Chemical Mechanical Polishing

본문

Author
H.-G. Kang, D.-H. Kim, T. Katoh, S.-J. Kim, U. Paik, J.-G. Park
Journal
Japanese Journal of Applied Physics
Vol
45
Page
3896
Year
2010~before